# Plasma processing

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**Plasma processing** is a [plasma](/source/Plasma_(physics))-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]

Plasma processing techniques include:

- [Plasma activation](/source/Plasma_activation)

- [Plasma ashing](/source/Plasma_ashing)

- [Plasma cleaning](/source/Plasma_cleaning)

- [Plasma electrolytic oxidation](/source/Plasma_electrolytic_oxidation)

- [Plasma etching](/source/Plasma_etching)

- [Plasma functionalization](/source/Plasma_functionalization)

- [Plasma polymerization](/source/Plasma_polymerization)

- [Corona treatment](/source/Corona_treatment)

- Plasma modification

Related topics are [plasma chemistry](/source/Plasma_chemistry), [chemical vapor deposition](/source/Chemical_vapor_deposition), and [physical vapor deposition](/source/Physical_vapor_deposition) processes like [sputter deposition](/source/Sputter_deposition), plasma iondoping, [vacuum plasmaspraying](/source/Vacuum_plasmaspraying), and [reactive ion etching](/source/Reactive_ion_etching).

## References

1. **[^](#cite_ref-1)** National Research Council (1991). [*Plasma Processing of Materials: Scientific Opportunities and Technological Challenges*](https://doi.org/10.17226/1875). Washington, DC: National Academies Press. [doi](/source/Doi_(identifier)):[10.17226/1875](https://doi.org/10.17226%2F1875). [ISBN](/source/ISBN_(identifier)) [978-0-309-04597-1](https://en.wikipedia.org/wiki/Special:BookSources/978-0-309-04597-1).

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